Item type |
デフォルトアイテムタイプ_(フル)(1) |
公開日 |
2023-03-18 |
タイトル |
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タイトル |
Spectroscopic study of debris mitigation with minimum-mass Sn laser plasma for extreme ultraviolet lithography |
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言語 |
en |
作成者 |
Namba, Shinichi
Fujioka, Shinsuke
Nishimura, Hiroaki
Yasuda, Yuzuri
Nagai, Keiji
Miyanaga, Noriaki
Izawa, Yasukazu
Mima, Kunioki
Takiyama, Ken
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アクセス権 |
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アクセス権 |
open access |
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アクセス権URI |
http://purl.org/coar/access_right/c_abf2 |
権利情報 |
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権利情報 |
Copyright (c) 2006 American Institute of Physics. |
内容記述 |
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内容記述 |
An experimental study was made of a target consisting of the minimum mass of pure tin (sSn) necessary for the highest conversion to extreme ultraviolet (sEUV) light while minimizing the generation of plasma debris. The minimum-mass target comprised a thin Sn layer coated on a plastic shell and was irradiated with a Nd:YAG laser pulse. The expansion behavior of neutral atoms and singly charged ions emanating from the Sn plasma were investigated by spatially resolved visible spectroscopy. A remarkable reduction of debris emission in the backward direction with respect to the incident laser beam was demonstrated with a decrease in the thickness of the Sn layer. The optimal thickness of the Sn layer for a laser pulse of 9 ns at 7×1010 W/cm2 was found to be 40 nm, at which low-debris emission in the backward direction and a high conversion to 13.5 nm EUV radiation were simultaneously attained. |
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言語 |
en |
出版者 |
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出版者 |
American Institute of Physics |
言語 |
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言語 |
eng |
資源タイプ |
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資源タイプ識別子 |
http://purl.org/coar/resource_type/c_6501 |
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資源タイプ |
journal article |
出版タイプ |
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出版タイプ |
VoR |
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出版タイプResource |
http://purl.org/coar/version/c_970fb48d4fbd8a85 |
関連情報 |
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識別子タイプ |
DOI |
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関連識別子 |
10.1063/1.2199494 |
関連情報 |
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識別子タイプ |
DOI |
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関連識別子 |
http://dx.doi.org/10.1063/1.2199494 |
収録物識別子 |
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収録物識別子タイプ |
ISSN |
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収録物識別子 |
0003-6951 |
収録物識別子 |
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収録物識別子タイプ |
NCID |
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収録物識別子 |
AA00543431 |
書誌情報 |
Applied Physics Letters
Applied Physics Letters
巻 88,
号 17,
発行日 2006-04-24
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旧ID |
18603 |