{"created":"2025-02-21T03:16:17.326541+00:00","id":2006279,"links":{},"metadata":{"_buckets":{"deposit":"7edca99b-4301-45a0-89b7-ad2468a70108"},"_deposit":{"created_by":41,"id":"2006279","owners":[41],"pid":{"revision_id":0,"type":"depid","value":"2006279"},"status":"published"},"_oai":{"id":"oai:hiroshima.repo.nii.ac.jp:02006279","sets":["1730444907710"]},"author_link":[],"item_1617186331708":{"attribute_name":"Title","attribute_value_mlt":[{"subitem_title":"Spectroscopic study of debris mitigation with minimum-mass Sn laser plasma for extreme ultraviolet lithography","subitem_title_language":"en"}]},"item_1617186419668":{"attribute_name":"Creator","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Namba, Shinichi","creatorNameLang":"en"}],"familyNames":[{"familyName":"Namba","familyNameLang":"en"}],"givenNames":[{"givenName":"Shinichi","givenNameLang":"en"}]},{"creatorNames":[{"creatorName":"Fujioka, Shinsuke","creatorNameLang":"en"}],"familyNames":[{"familyName":"Fujioka","familyNameLang":"en"}],"givenNames":[{"givenName":"Shinsuke","givenNameLang":"en"}]},{"creatorNames":[{"creatorName":"Nishimura, Hiroaki","creatorNameLang":"en"}],"familyNames":[{"familyName":"Nishimura","familyNameLang":"en"}],"givenNames":[{"givenName":"Hiroaki","givenNameLang":"en"}]},{"creatorNames":[{"creatorName":"Yasuda, Yuzuri","creatorNameLang":"en"}],"familyNames":[{"familyName":"Yasuda","familyNameLang":"en"}],"givenNames":[{"givenName":"Yuzuri","givenNameLang":"en"}]},{"creatorNames":[{"creatorName":"Nagai, Keiji","creatorNameLang":"en"}],"familyNames":[{"familyName":"Nagai","familyNameLang":"en"}],"givenNames":[{"givenName":"Keiji","givenNameLang":"en"}]},{"creatorNames":[{"creatorName":"Miyanaga, Noriaki","creatorNameLang":"en"}],"familyNames":[{"familyName":"Miyanaga","familyNameLang":"en"}],"givenNames":[{"givenName":"Noriaki","givenNameLang":"en"}]},{"creatorNames":[{"creatorName":"Izawa, Yasukazu","creatorNameLang":"en"}],"familyNames":[{"familyName":"Izawa","familyNameLang":"en"}],"givenNames":[{"givenName":"Yasukazu","givenNameLang":"en"}]},{"creatorNames":[{"creatorName":"Mima, Kunioki","creatorNameLang":"en"}],"familyNames":[{"familyName":"Mima","familyNameLang":"en"}],"givenNames":[{"givenName":"Kunioki","givenNameLang":"en"}]},{"creatorNames":[{"creatorName":"Takiyama, Ken","creatorNameLang":"en"}],"familyNames":[{"familyName":"Takiyama","familyNameLang":"en"}],"givenNames":[{"givenName":"Ken","givenNameLang":"en"}]}]},"item_1617186476635":{"attribute_name":"Access Rights","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_1617186499011":{"attribute_name":"Rights","attribute_value_mlt":[{"subitem_rights":"Copyright (c) 2006 American Institute of Physics."}]},"item_1617186626617":{"attribute_name":"Description","attribute_value_mlt":[{"subitem_description":"An experimental study was made of a target consisting of the minimum mass of pure tin (sSn) necessary for the highest conversion to extreme ultraviolet (sEUV) light while minimizing the generation of plasma debris. The minimum-mass target comprised a thin Sn layer coated on a plastic shell and was irradiated with a Nd:YAG laser pulse. The expansion behavior of neutral atoms and singly charged ions emanating from the Sn plasma were investigated by spatially resolved visible spectroscopy. A remarkable reduction of debris emission in the backward direction with respect to the incident laser beam was demonstrated with a decrease in the thickness of the Sn layer. The optimal thickness of the Sn layer for a laser pulse of 9 ns at 7×1010 W/cm2 was found to be 40 nm, at which low-debris emission in the backward direction and a high conversion to 13.5 nm EUV radiation were simultaneously attained.","subitem_description_language":"en"}]},"item_1617186643794":{"attribute_name":"Publisher","attribute_value_mlt":[{"subitem_publisher":"American Institute of Physics"}]},"item_1617186702042":{"attribute_name":"Language","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_1617186920753":{"attribute_name":"Source Identifier","attribute_value_mlt":[{"subitem_source_identifier":"0003-6951","subitem_source_identifier_type":"ISSN"},{"subitem_source_identifier":"AA00543431","subitem_source_identifier_type":"NCID"}]},"item_1617187056579":{"attribute_name":"Bibliographic Information","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2006-04-24","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"17","bibliographicVolumeNumber":"88","bibliographic_titles":[{"bibliographic_title":"Applied Physics Letters"},{"bibliographic_title":"Applied Physics Letters"}]}]},"item_1617258105262":{"attribute_name":"Resource Type","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_1617265215918":{"attribute_name":"Version Type","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_1617353299429":{"attribute_name":"Relation","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"10.1063/1.2199494","subitem_relation_type_select":"DOI"}},{"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://dx.doi.org/10.1063/1.2199494","subitem_relation_type_select":"DOI"}}]},"item_1617605131499":{"attribute_name":"File","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_access","date":[{"dateType":"Available","dateValue":"2023-03-18"}],"displaytype":"simple","filename":"AppPhysLet_88_171503.pdf","filesize":[{"value":"452.6 KB"}],"mimetype":"application/pdf","url":{"objectType":"fulltext","url":"https://hiroshima.repo.nii.ac.jp/record/2006279/files/AppPhysLet_88_171503.pdf"},"version_id":"dc45b8bc-9f80-453a-a135-eabd8f0ef1b6"}]},"item_1732771732025":{"attribute_name":"旧ID","attribute_value":"18603"},"item_title":"Spectroscopic study of debris mitigation with minimum-mass Sn laser plasma for extreme ultraviolet lithography","item_type_id":"40003","owner":"41","path":["1730444907710"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2023-03-18"},"publish_date":"2023-03-18","publish_status":"0","recid":"2006279","relation_version_is_last":true,"title":["Spectroscopic study of debris mitigation with minimum-mass Sn laser plasma for extreme ultraviolet lithography"],"weko_creator_id":"41","weko_shared_id":-1},"updated":"2025-02-21T07:06:43.394792+00:00"}