| Item type |
デフォルトアイテムタイプ_（フル）(1) |
| 公開日 |
2024-12-12 |
| タイトル |
|
|
タイトル |
Simple and facile synthesis of a CuS film using a copper formate–thioacetamide complex ink |
|
言語 |
en |
| 作成者 |
Tachibana, Tomoyuki
Osaki, Yuri
Lee, Ji Ha
Yabuki, Akihiro
|
| アクセス権 |
|
|
アクセス権 |
embargoed access |
|
アクセス権URI |
http://purl.org/coar/access_right/c_f1cf |
| 権利情報 |
|
|
言語 |
en |
|
権利情報 |
© 2024. This manuscript version is made available under the CC-BY-NC-ND 4.0 license https://creativecommons.org/licenses/by-nc-nd/4.0/ |
| 権利情報 |
|
|
言語 |
en |
|
権利情報 |
This is not the published version. Please cite only the published version. |
| 権利情報 |
|
|
言語 |
ja |
|
権利情報 |
この論文は出版社版ではありません。引用の際には出版社版をご確認、ご利用ください。 |
| 主題 |
|
|
言語 |
en |
|
主題Scheme |
Other |
|
主題 |
Copper sulfide |
| 主題 |
|
|
言語 |
en |
|
主題Scheme |
Other |
|
主題 |
Copper formate |
| 主題 |
|
|
言語 |
en |
|
主題Scheme |
Other |
|
主題 |
Thioacetamide |
| 主題 |
|
|
言語 |
en |
|
主題Scheme |
Other |
|
主題 |
Thermal decomposition |
| 内容記述 |
|
|
内容記述 |
In this study, we developed a simple and facile synthesis method for producing CuS films at low temperatures. The method uses self-reducible complex inks comprising copper formate (Cuf) as the copper source and thioacetamide (TA) as both the sulfur source and complexing agent. The thermal properties of complex inks with different TA/Cuf ratios (0.5–2.0) were analyzed. The ink with a TA/Cuf ratio of 1 exhibited a significant decrease in the reduction temperature. The synthesis of a CuS film involved calcination of the ink at 140 °C; however, some residual Cuf was observed. Introducing hexanol to the ink, aimed at prolonging the liquid-phase reaction, yielded a pure CuS film that contained agglomerated particles. The thermal reduction pathway of Cuf to CuS was analyzed through thermogravimetric–mass spectrometric analysis, and the results revealed that the low-temperature synthesis was attributed to the formation of acetonitrile and formic acid during thermal decomposition of the ink. |
|
言語 |
en |
| 出版者 |
|
|
出版者 |
Elsevier |
|
言語 |
en |
| 言語 |
|
|
言語 |
eng |
| 資源タイプ |
|
|
資源タイプ識別子 |
http://purl.org/coar/resource_type/c_6501 |
|
資源タイプ |
journal article |
| 出版タイプ |
|
|
出版タイプ |
AM |
|
出版タイプResource |
http://purl.org/coar/version/c_ab4af688f83e57aa |
| 関連情報 |
|
|
関連タイプ |
isVersionOf |
|
|
識別子タイプ |
DOI |
|
|
関連識別子 |
https://doi.org/10.1016/j.cap.2024.06.017 |
| 開始ページ |
|
|
開始ページ |
81 |
| 書誌情報 |
en : Current Applied Physics
巻 66,
p. 81-87,
発行日 2024-07-03
|
| 旧ID |
55852 |
| 備考 |
The full-text file will be made open to the public on 3 July 2026 in accordance with publisher's 'Terms and Conditions for Self-Archiving' |
CAP_66_81.pdf (4.4 MB)
