| Item type |
デフォルトアイテムタイプ_（フル）(1) |
| 公開日 |
2023-03-18 |
| タイトル |
|
|
タイトル |
Suppression of particle generation in a plasma process using a sine-wave modulated rf plasma |
|
言語 |
en |
| 作成者 |
Kashihara, Nobuki
Setyawan, Heru
Shimada, Manabu
Hayashi, Yutaka
Kim, Chan Soo
Okuyama, Kikuo
Winardi, Sugeng
|
| アクセス権 |
|
|
アクセス権 |
open access |
|
アクセス権URI |
http://purl.org/coar/access_right/c_abf2 |
| 権利情報 |
|
|
権利情報 |
Copyright (c) 2006 Springer "The original publication is available at www.springerlink.com" |
| 主題 |
|
|
主題Scheme |
Other |
|
主題 |
Nanoparticle |
| 主題 |
|
|
主題Scheme |
Other |
|
主題 |
Particle generation control |
| 主題 |
|
|
主題Scheme |
Other |
|
主題 |
Plasma reactor |
| 主題 |
|
|
主題Scheme |
Other |
|
主題 |
Sine-wave modulation |
| 主題 |
|
|
主題Scheme |
NDC |
|
主題 |
430 |
| 内容記述 |
|
|
内容記述 |
Sine-wave modulated rf plasma has been used to control particle generation and growth in a plasma-enhanced chemical vapor deposition of silicon dioxide thin films using TEOS/O2. The density and the size of particles generated in the plasma are greatly reduced when the plasma is modulated with sine-wave modulation at low modulation frequency (<1000 Hz). In addition, particle contamination on the films is significantly reduced also for nanoparticles, and the film growth rates at the range of modulation frequencies where particle generation are greatly reduced do not decrease appreciably. Compared to its counterpart pulse-wave modulation plasma, the sine-wave modulation plasma has demonstrated a better performance in terms of reduction of particle generation and film contamination, and of film growth rate. Thus, the sine-wave modulation plasma has shown as a promising method to be applied in the production of thin film with a high deposition rate and a low particle contamination. |
|
言語 |
en |
| 出版者 |
|
|
出版者 |
Springer |
| 言語 |
|
|
言語 |
eng |
| 資源タイプ |
|
|
資源タイプ識別子 |
http://purl.org/coar/resource_type/c_6501 |
|
資源タイプ |
journal article |
| 出版タイプ |
|
|
出版タイプ |
AO |
|
出版タイプResource |
http://purl.org/coar/version/c_b1a7d7d4d402bcce |
| 関連情報 |
|
|
|
識別子タイプ |
DOI |
|
|
関連識別子 |
10.1007/s11051-005-9005-1 |
| 関連情報 |
|
|
関連タイプ |
isVersionOf |
|
|
識別子タイプ |
DOI |
|
|
関連識別子 |
http://dx.doi.org/10.1007/s11051-005-9005-1 |
| 収録物識別子 |
|
|
収録物識別子タイプ |
ISSN |
|
収録物識別子 |
1388-0764 |
| 収録物識別子 |
|
|
収録物識別子タイプ |
NCID |
|
収録物識別子 |
AA11551748 |
| 開始ページ |
|
|
開始ページ |
395 |
| 書誌情報 |
Journal of Nanoparticle Research
Journal of Nanoparticle Research
巻 8,
号 3-4,
p. 395-403,
発行日 2006-08
|
| 旧ID |
15361 |
JNanopracRes_8_395.pdf (1.1 MB)
