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Characterization of Electronic Charged States of Si-Based Quantum Dots and Their Application to Floating Gate Memories
https://hiroshima.repo.nii.ac.jp/records/2000889
https://hiroshima.repo.nii.ac.jp/records/2000889c5b1b7a1-a039-460d-ad2d-f93ef4228d07
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
ECST_2_157.pdf (332.3 KB)
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| Item type | デフォルトアイテムタイプ_（フル）(1) | |||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| 公開日 | 2023-03-18 | |||||||||||
| タイトル | ||||||||||||
| タイトル | Characterization of Electronic Charged States of Si-Based Quantum Dots and Their Application to Floating Gate Memories | |||||||||||
| 言語 | en | |||||||||||
| 作成者 |
Miyazaki, Seiichi
× Miyazaki, Seiichi
× Ikeda, Mitsuhisa
× Makihara, Katsunori
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| アクセス権 | ||||||||||||
| アクセス権 | open access | |||||||||||
| アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||||||||
| 権利情報 | ||||||||||||
| 権利情報 | Copyright (c) 2006 The Electrochemical Society | |||||||||||
| 内容記述 | ||||||||||||
| 内容記述 | Nanometer-size Si quantum dots (Si-QDs) with and without Ge core were prepared on thermally-grown SiO2 in a self-assembling manner by controlling the early stages of low pressure chemical vapor deposition (LPCVD). The surface potential changes in individual dots caused by charging or discharging of one electron or a few as were measured by using a Kelvin probe technique in an atomic force microscope (AFM). For Si-QDs larger than 20nm in dot height, surface potential images with a characteristic potential profile with a dimple around the center of the charged dots are observable after electron or hole injection, indicating Coulomb repulsion among the charges retained in the dot. For Si-QDs with a Ge core, electrons are retained stably in Si clad while holes in Ge core, reflecting the energy band discontinuity at the interface between the Si clad and the Ge core. The influence of phosphorous doping to Si-QDs on their electron charging and discharging characteristics was also been studied. Electrical characteristics of metal-oxide-semiconductor (MOS) capacitors and n-channel MOS field-effect-transistors (nMOSFETs) with Si-QDs floating gates confirm multiple-step charging to and discharging from the Si-QDs floating gate at room temperature. From the temporal changes in the drain current with gate voltage switching, it is suggested that the change in the electron distribution in the Si-QDs floating gate play an important role to trigger the transition from a metastable charged state to the next charged state. | |||||||||||
| 言語 | en | |||||||||||
| 出版者 | ||||||||||||
| 出版者 | The Electrochemical Society | |||||||||||
| 言語 | ||||||||||||
| 言語 | eng | |||||||||||
| 資源タイプ | ||||||||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_5794 | |||||||||||
| 資源タイプ | conference paper | |||||||||||
| 出版タイプ | ||||||||||||
| 出版タイプ | AO | |||||||||||
| 出版タイプResource | http://purl.org/coar/version/c_b1a7d7d4d402bcce | |||||||||||
| 関連情報 | ||||||||||||
| 識別子タイプ | DOI | |||||||||||
| 関連識別子 | 10.1149/1.2193884 | |||||||||||
| 関連情報 | ||||||||||||
| 識別子タイプ | DOI | |||||||||||
| 関連識別子 | http://dx.doi.org/10.1149/1.2193884 | |||||||||||
| 収録物識別子 | ||||||||||||
| 収録物識別子タイプ | NCID | |||||||||||
| 収録物識別子 | BA78566750 | |||||||||||
| 開始ページ | ||||||||||||
| 開始ページ | 157 | |||||||||||
| 書誌情報 |
ECS Transactions ECS Transactions 巻 2, 号 1, p. 157-164, 発行日 2006 |
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| 旧ID | 17061 | |||||||||||
